UHPLab offers the best low temp and high temp ALD systems. All of our systems are a 110V plug and play design with full automation software control.
We use only the best parts and materials.
* MDC Vacuum chamber
* Swagelok valves, fittings and precursors
* Leybold or Pfeiffer vacuum pumps
* Sedona visual controls software, fully automated control software
* Lambda DC power supply
* Momentive ceramics custom PBN cup heater
* Custom positive pressure N2 Glove box
* 4 port ALD manifold standard
* 50 CC crucibles for Thick ALD / longer run times
* MFC controlled carrier gas with heater
* Single input manifold
* Stop valve
* Turbo pump with fast pneumatic valve
Low Temp ALD 350C heated / water-cooled chamber (water-cooled with bypass valve for both Hot wall and Cold wall processing and faster cool down times for low temp process.)
* Batch processing (1-10 wafers) with 2 quartz carriers. Batch chambers work for particle coating also.
* Low Vapor pressure / booster valve option
* Heated Lid for larger batch processing of a full cassette (25 wafers… Like a vertical furnace)
* Ultra High Vacuum ALD (conflat flanges and turbo pump / throttle valve) Great for super conducting metals.
* High Temp ALD with UHV chamber ( water cooled PBN heater up to 1500 deg C with graphite carrier, 1200C with Quartz carrier)
* PEALD with Remote Plasma (top down / single wafer). Low temp or high temp option.
* Ozone generator with MFC from INUSA.