Univex 450 sputter system upgrade.
UHPLab built a custom water cooled heated stage and added it to existing equipment. We also modified the software and PLC which allowed us to achieve the requirements of the client. We increased the temperature from 300 to 600 degrees C; we rotated the sample directly under one Sputter gun for TiN2 and ALN2 single crystal film; we utilized the existing hardware for rotation and RF; and we provided a custom sample holder that can tilt up to 20 degrees C for better uniformity across a patterned wafer.
CVD heater with water cooled mount.
Custom source flange with rotation and lift for UHVCVD. Up to 1700 degree C sample temp with custom PBN heater.
16.5" Source Flange for UHPCVD system.
Custom source flange for Ultra High Purity CVD with rotation and lift. Process temp of 800C. Custom quartz scepter with lift and rotation. Molybdenum refractory metal used for gears and heat shielding. Paralytic graphite heater contacts. Water cooled PBN heater.